EOS/ESD Association, Inc. White Paper – Electrostatic Discharge (ESD)/Electrostatic Attraction (ESA) Considerations in Semiconductor Wafer Fab and Associated Facilities

The purpose of this document is to present the differences between ANSI/ESD S20.20 (and the similar IEC 61340-5-1) requirements and recommendations for best practices for electrostatic discharge (ESD) / electrostatic attraction (ESA) control in semiconductor wafer fab and mask house facilities.